Mark-Alexander Henn
Mark-Alexander Henn
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Zitiert von
Zitiert von
A maximum likelihood approach to the inverse problem of scatterometry
MA Henn, H Gross, F Scholze, M Wurm, C Elster, M Bär
Optics Express 20 (12), 12771-12786, 2012
Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry
H Gross, MA Henn, S Heidenreich, A Rathsfeld, M Bär
Applied Optics 51 (30), 7384-7394, 2012
Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization
J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn
Light: Science & Applications 5 (2), e16038-e16038, 2016
Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM
G Dai, K Hahm, F Scholze, MA Henn, H Gross, J Fluegge, H Bosse
Measurement Science and Technology 25 (4), 044002, 2014
Improved reconstruction of critical dimensions in extreme ultraviolet scatterometry by modeling systematic errors
MA Henn, H Gross, S Heidenreich, F Scholze, C Elster, M Baer
Measurement Science and Technology 25 (4), 044003, 2014
Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry
MA Henn, S Heidenreich, H Gross, A Rathsfeld, F Scholze, M Bär
Optics Letters 37 (24), 5229-5231, 2012
First steps towards a scatterometry reference standard
B Bodermann, PE Hansen, S Burger, MA Henn, H Gross, M Bär, ...
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and …, 2012
A surrogate model enables a Bayesian approach to the inverse problem of scatterometry
S Heidenreich, H Gross, MA Henn, C Elster, M Bär
Journal of Physics: Conference Series 490 (1), 012007, 2014
Modelling line edge roughness in periodic line-space structures by Fourier optics to improve scatterometry
H Gross, S Heidenreich, MA Henn, G Dai, F Scholze, M Bär
Journal of the European Optical Society-Rapid publications 9, 2014
Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression
MA Henn, RM Silver, JS Villarrubia, NF Zhang, H Zhou, BM Barnes, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 044001, 2015
Comparison of CD measurements of an EUV photomask by EUV scatterometry and CD-AFM
F Scholze, V Soltwisch, G Dai, MA Henn, H Gross
Photomask Technology 2013 8880, 68-79, 2013
Combining model-based measurement results of critical dimensions from multiple tools
NF Zhang, BM Barnes, H Zhou, MA Henn, RM Silver
Measurement Science and Technology 28 (6), 065002, 2017
Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry
J Endres, N Kumar, P Petrik, MA Henn, S Heidenreich, SF Pereira, ...
Optical Micro-and Nanometrology V 9132, 39-47, 2014
Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths
BM Barnes, H Zhou, MA Henn, MY Sohn, RM Silver
Modeling Aspects in Optical Metrology VI 10330, 192-206, 2017
Hyponormal and strongly hyponormal matrices in inner product spaces
MA Henn, C Mehl, C Trunk
Linear algebra and its applications 433 (6), 1055-1076, 2010
On numerical reconstructions of lithographic masks in DUV scatterometry
MA Henn, R Model, M Bär, M Wurm, B Bodermann, A Rathsfeld, H Gross
Modeling Aspects in Optical Metrology II 7390, 247-257, 2009
Applications of machine learning at the limits of form-dependent scattering for defect metrology
MA Henn, H Zhou, RM Silver, BM Barnes
Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019
Assessing the wavelength extensibility of optical patterned defect inspection
BM Barnes, H Zhou, MA Henn, MY Sohn, RM Silver
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
Light Sci
Z Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn
Appl 4, e298, 2015
Data-driven approaches to optical patterned defect detection
MA Henn, H Zhou, BM Barnes
OSA continuum 2 (9), 2683-2693, 2019
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