| Modified Tauc–Lorentz dispersion model leading to a more accurate representation of absorption features below the bandgap DV Likhachev, N Malkova, L Poslavsky Thin Solid Films 589, 844-851, 2015 | 80 | 2015 |
| Selecting the right number of knots for B-spline parameterization of the dielectric functions in spectroscopic ellipsometry data analysis DV Likhachev Thin Solid Films 636, 519-526, 2017 | 41 | 2017 |
| Model selection in spectroscopic ellipsometry data analysis: Combining an information criteria approach with screening sensitivity analysis DV Likhachev Applied Surface Science 421, 617-623, 2017 | 24 | 2017 |
| On the optimization of knot allocation for B-spline parameterization of the dielectric function in spectroscopic ellipsometry data analysis DV Likhachev Journal of Applied Physics 129 (3), 2021 | 17 | 2021 |
| Spectroscopic ellipsometry of ion-implantation-induced damage D Shamiryan, DV Likhachev Ion Implantation, 89-104, 2012 | 16 | 2012 |
| Parametric sensitivity analysis as an essential ingredient of spectroscopic ellipsometry data modeling: An application of the Morris screening method DV Likhachev Journal of Applied Physics 126 (18), 2019 | 15 | 2019 |
| A practitioner's approach to evaluation strategy for ellipsometric measurements of multilayered and multiparametric thin-film structures DV Likhachev Thin Solid Films 595, 113–117, 2015 | 14 | 2015 |
| A practical method for optical dispersion model selection and parameters variations in scatterometry analysis with variable n&k's DV Likhachev Thin Solid Films 562, 90-98, 2014 | 14 | 2014 |
| Spectroscopic ellipsometry data analysis using penalized splines representation for the dielectric function DV Likhachev Thin Solid Films 669, 174-180, 2019 | 13 | 2019 |
| B-spline parameterization of the dielectric function and information criteria: The craft of non-overfitting DV Likhachev Modeling Aspects in Optical Metrology VI 10330, 49-58, 2017 | 13 | 2017 |
| Efficient thin-film stack characterization using parametric sensitivity analysis for spectroscopic ellipsometry in semiconductor device fabrication DV Likhachev Thin Solid Films 589, 258–263, 2015 | 11 | 2015 |
| Certain topics in ellipsometric data modeling with splines: a review of recent developments DV Likhachev Advanced Optical Technologies 11 (3-4), 93-115, 2022 | 10 | 2022 |
| Quantitative characterization and modeling of sub-bandgap absorption features in thin oxide films from spectroscopic ellipsometry data DV Likhachev, N Malkova, L Poslavsky AIMS Materials Science 2, 356–368, 2015 | 6 | 2015 |
| Low-k n&k variation impact on CD accuracy of scatterometry Y Chen, M Yamamoto, D Likhachev, G He, A Sonoda, V Vuong Metrology, Inspection, and Process Control for Microlithography XXII 6922 …, 2008 | 6 | 2008 |
| Optimization of the dielectric-function modeling by B-splines in spectroscopic ellipsometry analysis: A hybrid approach DV Likhachev Thin Solid Films 762, 139545, 2022 | 5 | 2022 |
| Evaluation of different dispersion models for correlation of spectroscopic ellipsometry and X-ray reflectometry DV Likhachev Review of Scientific Instruments 90 (2), 2019 | 5 | 2019 |
| Context-based virtual metrology P Ebersbach, AM Urbanowicz, D Likhachev, C Hartig, M Shifrin Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018 | 4 | 2018 |
| Characterization of complex inter-layer dielectric stack by spectroscopic ellipsometry: A simple method to reduce parameters correlations DV Likhachev Thin solid films 550, 305-311, 2014 | 4 | 2014 |
| Spin fluctuation theory for temperature-induced ferromagnetism in itinerant antiferromagnets and paramagnets AA Povzner, DV Likhachev International Journal of Modern Physics B 9 (10), 1171-1184, 1995 | 4 | 1995 |
| Integrated ODP metrology with floating n&k's for lithography process P Kearney, D Likhachev, J Uchida, G Fleischer Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 3 | 2009 |
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