Követés
M. David Henry
M. David Henry
Sandia National Labs - Distinguished Member of the Technical Staff
E-mail megerősítve itt: sandia.gov
Cím
Hivatkozott rá
Hivatkozott rá
Év
Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars
MD Henry, S Walavalkar, A Homyk, A Scherer
Nanotechnology 20 (25), 255305, 2009
1972009
Phase-exchange-driven wake-up and fatigue in ferroelectric hafnium zirconium oxide films
SS Fields, SW Smith, PJ Ryan, ST Jaszewski, IA Brummel, A Salanova, ...
ACS applied materials & interfaces 12 (23), 26577-26585, 2020
1232020
Tunable visible and near-IR emission from sub-10 nm etched single-crystal Si nanopillars
SS Walavalkar, CE Hofmann, AP Homyk, MD Henry, HA Atwater, ...
Nano letters 10 (11), 4423-4428, 2010
1162010
Pyroelectric response in crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films
JFI S. W. Smith, A. R. Kitahara, M. A. Rodriguez, M. D. Henry, M. T. Brumbach
Applied Physics Letters 110 (072901), 2017
1062017
ICP etching of silicon for micro and nanoscale devices
MD Henry
California Institute of Technology, 2010
842010
Ga+ beam lithography for nanoscale silicon reactive ion etching
MD Henry, MJ Shearn, B Chhim, A Scherer
Nanotechnology 21 (24), 245303, 2010
812010
Advanced plasma processing: etching, deposition, and wafer bonding techniques for semiconductor applications
M Shearn, X Sun, MD Henry, A Yariv, A Scherer
Semiconductor technologies 27, 81-105, 2010
732010
Al0. 68Sc0. 32N Lamb wave resonators with electromechanical coupling coefficients near 10.28%
G Esteves, TR Young, Z Tang, S Yen, TM Bauer, MD Henry, RH Olsson
Applied Physics Letters 118 (17), 2021
632021
Methods for fabrication of high aspect ratio micropillars and nanopillars
MD Henry, AP Homyk, A Scherer, S Walavalkar
US Patent 8,148,264, 2012
582012
Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors
MD Henry, C Welch, A Scherer
Journal of Vacuum Science & Technology A 27 (5), 1211-1216, 2009
492009
Origin of ferroelectric phase stabilization via the clamping effect in ferroelectric hafnium zirconium oxide thin films
SS Fields, T Cai, ST Jaszewski, A Salanova, T Mimura, HH Heinrich, ...
Advanced Electronic Materials 8 (12), 2200601, 2022
412022
Radial pn junction, wire array solar cells
BM Kayes, MA Filler, MD Henry, JR Maiolo Iii, MD Kelzenberg, ...
2008 33rd IEEE Photovoltaic Specialists Conference, 1-5, 2008
402008
Surface encapsulation for low-loss silicon photonics
M Borselli, TJ Johnson, CP Michael, MD Henry, O Painter
Applied Physics Letters 91 (13), 131117-131117-3, 2007
392007
Size tunable visible and near-infrared photoluminescence from vertically etched silicon quantum dots
SS Walavalkar, AP Homyk, CE Hofmann, MD Henry, C Shin, HA Atwater, ...
Applied Physics Letters 98 (15), 2011
362011
Controllable deformation of silicon nanowires with strain up to 24%
SS Walavalkar, AP Homyk, MD Henry, A Scherer
Journal of Applied Physics 107 (12), 2010
322010
Reactive sputter deposition of piezoelectric Sc0. 12Al0. 88N for contour mode resonators
MD Henry, TR Young, EA Douglas, BA Griffin
Journal of Vacuum Science & Technology B 36 (3), 2018
312018
Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films
SS Fields, DH Olson, ST Jaszewski, CM Fancher, SW Smith, DA Dickie, ...
Applied Physics Letters 118 (10), 2021
282021
Thermal resistance and heat capacity in hafnium zirconium oxide (Hf1–xZrxO2) dielectrics and ferroelectric thin films
EA Scott, SW Smith, MD Henry, CM Rost, A Giri, JT Gaskins, SS Fields, ...
Applied Physics Letters 113 (19), 2018
282018
Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices
SS Walavalkar, AP Homyk, MD Henry, A Scherer
Nanoscale 5 (3), 927-931, 2013
282013
Methods for fabricating passivated silicon nanowires and devices thus obtained
A Scherer, S Walavalkar, MD Henry, AP Homyk
US Patent 8,080,468, 2011
282011
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